The large drawer-type UV light cleaning machine is suitable for cleaning medium to large-sized substrates, such as liquid crystal panels, ITO/FTO conductive glass, wafers, OLEDs, LCDs, silicon wafers, ceramics, metal sheets, polymers, silicone rubber, and other surfaces. It can effectively clean organic substances on the surface of the substrates, thereby achieving surface modification
· Clean silicon wafer, Gallium Arsenide wafer, quartz and ITO glass
· Clean all types of oxide single crystal substrate such sapphire, STO, and LAO.
· Clean gold and Pt surface
· Oxidizing surface of light metallic material
· Activate Polymers and Crosslink Polymers
· UV Strip Photo Resist / Photoresist
· UV Clean Production Line LED displays
| Construction Material | Stainless Steel 304 |
| Key Components | Schneider Electric, Omron, etc. |
| Power Supply | 220V |
| UV Lamp | Power and dimensions customizable based on customer requirements; Lifespan: 8,000 hours |
| Main Operating Spectrum | 185nm + 254nm |
| Effective Cleaning Area | 350 × 350 mm (Customizable with larger sizes such as 400×400 mm, 500×500 mm, 600×600 mm, 650×650 mm, etc.) |
| Cleaning Timer | 0 – 99.99 hours or minutes |
| Safety Protection | Lamp automatically extinguishes when the cleaning chamber door is opened |
| Irradiation Height | Customizable |
| Indicators | UV ON/OFF indicator, abnormal status indicator/alarm |
| Lamp Preheating | Preheating indicator function to ensure precise cleaning data |
| Heating (Optional) | Optional external heating platform; Temperature range: ambient ~ 300°C |
| Exhaust Function | Built-in ozone exhaust system with adjustable speed settings; 125 mm diameter outlet, includes ducting and fasteners |
Enter your email to receive the latest information about Chengyi
Copyright © Henan Chengyi Equipment Science and Technology Co.,Ltd.
All Rights Reserved | Sitemap